美国Alluxa是一家通过ISO 9001:2015认证、ITAR注册的高性能光学滤光片和薄膜涂层制造商。自2007年以来，Alluxa在精密薄膜制造领域内迅速成长，其工程团队通过完善其先进的SIRRUS™等离子沉积工艺，产品具有高透过率，深度抑制杂散光，过渡带宽窄，损伤阈值高的特点，深受科研和OEM用户的青睐，并被广泛应用于激光雷达，流式细胞仪，荧光PCR等领域。
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UBP1064-0.5 OD61064 nm center wavelength (CWL), 0.5 nm full-width at half-maximum (FWHM), and wide-range OD6 out-of-band blocking from 200 nm to 1200 nm.
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UBP1064.9-0.4 OD51064.9 nm center wavelength (CWL), 0.4 nm full-width at half-maximum (FWHM), and wide-range OD5 out-of-band blocking from 200 nm to 1150 nm.
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UBP1064.7-1 OD71064.7 nm center wavelength (CWL), 1 nm full-width at half-maximum (FWHM), and wide-range OD7 out-of-band blocking from 300 nm to 1100 nm.
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UBP1064.6-0.4 OD61064.6 nm center wavelength (CWL), a 0.4 nm full-width at half-maximum (FWHM), and OD6 blocking from 300 nm to 1000 nm.
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UBP1064.4-2 OD61064.4 nm center wavelength (CWL), 2 nm full-width at half-maximum (FWHM), and wide-range OD6 out-of-band blocking from 800 nm to 1800 nm.
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UBP1064.4-1 OD71064.4 nm center wavelength (CWL), a 1 nm full-width at half-maximum (FWHM), and wide-range OD7 out-of-band blocking from 300 nm to 1100 nm.
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UBP1064.2-0.6 OD51064.2 nm center wavelength (CWL), 0.6 nm full-width at half-maximum (FWHM), and wide-range OD5 out-of-band blocking from 300 nm to 1300 nm.
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UBP1064.16-0.4 OD51064.16 nm center wavelength (CWL), a 0.4 nm full-width at half-maximum (FWHM), and wide-range OD5 out-of-band blocking from 200 nm to 1150 nm.
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UBP1064.15-1.8 OD61064.15 nm center wavelength (CWL), a 1.8 nm full-width at half-maximum (FWHM), and wide-range OD6 out-of-band blocking from 400 nm to 1300 nm.
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UBP1064.1-1 OD71064.1 nm center wavelength (CWL), 1 nm full-width at half-maximum (FWHM), and wide-range OD7 out-of-band blocking from 300 nm to 1100 nm.
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UBP1063.9-1 OD61063.9 nm center wavelength (CWL), 1 nm full-width at half-maximum (FWHM), and wide-range OD6 out-of-band blocking from 800 nm to 1600 nm.
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UBP1063.5-1 OD71063.5 nm center wavelength (CWL), 1 nm full-width at half-maximum (FWHM), and wide-range OD7 out-of-band blocking from 300 nm to 1100 nm.